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Atomic Layer Deposition Market (Type - Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Other Types; Applications - Semiconductors, Solar Devices, Electronics, Medical Equipment, and Other Applications): Global Industry Analysis, Trends, Size, Share and Forecasts to 2025

Atomic Layer Deposition Market (Type - Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Other Types; Applications - Semiconductors, Solar Devices, Electronics, Medical Equipment, and Other Applications): Global Industry Analysis, Trends, Size, Share and Forecasts to 2025

Report Code: EIM0252 Category: Energy, Mining and Infrastructure Published: July, 2019

A recent report published by Infinium Global Research on the atomic layer deposition market provides an in-depth analysis of segments and sub-segments in the global as well as regional atomic layer deposition market. The study also highlights the impact of drivers, restraints, and macro indicators on the global and regional atomic layer deposition market over the short term as well as long term. The report is a comprehensive presentation of trends, forecast and dollar values of the global atomic layer deposition market. According to the report, the global atomic layer deposition market is projected to grow at a CAGR of 24.6% over the forecast period of 2019-2025.

Market Insight

Atomic Layer Deposition (ALD) provides a very controlled method to produce a film to anatomically specified thickness. It is a powerful technique for the fabrication of atomically precise coatings on a variety of surfaces. It is very beneficial to those in the field of microelectronics and nanotechnology in producing small, but efficient semiconductors. Recent progress has extended the application space of ALD into emerging areas, including energy conversion and storage, catalysis, biomedical devices, and environmental devices.

The increasing use of ALD film coating techniques in the production of a variety of electronic devices and components in the semiconductor industry is a major driving factor of the ALD market. The demand for atomic layer deposition is rising as it enables the use of new materials and designs for advanced chip manufacturing. ALD is a key process in the construction of semiconductor devices, and part of the set of tools available for the synthesis of nano-technology materials. It is considered as one of the greater deposition methods for producing thin and conformal films. Furthermore, factors such as the growing electronics industry, semiconductor solutions, and increasing demand from current & emerging applications such as dye-sensitized solar cells are other driving factors of the market growth. However, high investment costs in R&D hampers the growth of the market. Moreover, increasing the application of ALD equipment in hydrophobic coatings, flexible electronics, and electronic textiles is expected to provide lucrative growth opportunities to the market players.

Geographically, Asia-Pacific dominates the global atomic layer deposition market due to the increasing demand for end-use industries such as semiconductors, electronics, medical equipment as well as the solar sector. The demand for atomic layer deposition is increasing in countries such as China, South Korea, and Taiwan due to their deep-rooted electronics manufacturing base. North America is the second-largest market for atomic layer deposition owing to productive regulatory government support to promote domestic private investment.

Atomic Layer Deposition Market

Segment Covered

The report on the global atomic layer deposition market covers segments such as type and applications. On the basis of type, the sub-markets include metal ALD, aluminum oxide ALD, plasma enhanced ALD, catalytic ALD, and other types. On the basis of applications, the sub-markets include semiconductors, solar devices, electronics, medical equipment, and other applications. 

Companies Profiled:

The report provides profiles of the companies in the market such as Lam Research Corporation, Applied Materials Inc., ASM International NV, Aixtron SE, Adeka Corporation, ALD NanoSolutions, Inc., Denton Vacuum LLC, Tokyo Electron Limited, Kurt J. Lesker Company, Veeco Instrument, and other companies. 

Report Highlights:

The report provides deep insights into the demand forecasts, market trends, and micro and macro indicators. In addition, this report provides insights into the factors that are driving and restraining the growth in this market. Moreover, The IGR-Growth Matrix analysis given in the report brings an insight into the investment areas that existing or new market players can consider. The report provides insights into the market using analytical tools such as Porter's five forces analysis and DRO analysis of the atomic layer deposition market. Moreover, the study highlights current market trends and provides forecast from 2019-2025. We also have highlighted future trends in the market that will affect the demand during the forecast period. Moreover, the competitive analysis given in each regional market brings an insight into the market share of the leading players.

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